hk company search

MERIT VANTAGE LIMITED
(Company Registration No. 2066011)

MERIT VANTAGE LIMITED was established on 26-Mar-2014, CR No. is: 2066011, The company is Dissolved now, The company belongs to Company. As so far this company has running for11years 2months 3weeks 6days .

Company Name:
MERIT VANTAGE LIMITED
Chinese Company Name::
賢利有限公司
Company Registration No.：
2066011
Date of Incorporation:
2014-03-26
Company Type:
Private company limited by shares
Company Status::
Dissolved
Date of Dissolution:
2017-11-10
Date of Annual Examination::
Mar 26 - May 07
Remarks:
Dissolved by Deregistration
Register of Charges::
Unavailable
Name History:
26-MAR-2014
MERIT VANTAGE LIMITED
賢利有限公司
Updated on
2019-08-14
Popular Companies

MERIT VANTAGE LIMITED

Cr No. 2605953
Company Status: Live

MERIT VANTAGE LIMITED was incorporated on 2017-11-10.

MERIT ENTERPRISES LIMITED -THE-

Cr No. 0008247
Company Status: Dissolved

MERIT ENTERPRISES LIMITED -THE- was incorporated on 1962-11-26.

MERIT MANAGEMENT, LIMITED

Cr No. 0013735
Company Status: Dissolved

MERIT MANAGEMENT, LIMITED was incorporated on 1967-01-14.

MERIT PRODUCTS LIMITED

Cr No. 0059629
Company Status: Dissolved

MERIT PRODUCTS LIMITED was incorporated on 1978-04-18.

MERIT (CHINA) LIMITED

Cr No. 0083163
Company Status: Dissolved

MERIT (CHINA) LIMITED was incorporated on 1980-06-13.

EVER MERIT COMPANY LIMITED

Cr No. 0105573
Company Status: Live

EVER MERIT COMPANY LIMITED was incorporated on 1981-11-17.

GREAT MERIT INVESTMENTS LIMITED

Cr No. 0122024
Company Status: Dissolved

GREAT MERIT INVESTMENTS LIMITED was incorporated on 1983-03-01.

SUPER MERIT COMPANY LIMITED

Cr No. 0128004
Company Status: Dissolved

SUPER MERIT COMPANY LIMITED was incorporated on 1983-09-06.

MERIT ORIGIN LIMITED

Cr No. 0132120
Company Status: Dissolved

MERIT ORIGIN LIMITED was incorporated on 1984-01-10.

Advertising
Recently incorporated companies
Incorporated on the same day
2014-03-26
Privacy Statement
Copyright © 2016 - 2025 Hong Kong Company Directory. All Rights Reserved.